Field effect transistor with negative capacitance dieletric structures

ABSTRACT

The structure of a semiconductor device with negative capacitance (NC) dielectric structures and a method of fabricating the semiconductor device are disclosed. A method of fabricating the semiconductor device includes forming a fin structure with a fin base portion and a fin top portion on a substrate, forming a spacer structure in a first region of the fin top portion, and forming a gate structure on a second region of the fin top portion. The spacer structure includes a first NC dielectric material and the gate structure includes a gate dielectric layer with a second NC dielectric material different from the first NC dielectric material.

BACKGROUND

With advances in semiconductor technology, there has been increasingdemand for higher storage capacity, faster processing systems, higherperformance, and lower costs. To meet these demands, the semiconductorindustry continues to scale down the dimensions of semiconductordevices, such as metal oxide semiconductor field effect transistors(MOSFETs), including planar MOSFETs and fin field effect transistors(finFETs). Such scaling down has increased power consumption andparasitic capacitance in semiconductor devices.

BRIEF DESCRIPTION OF THE DRAWINGS

Aspects of this disclosure are best understood from the followingdetailed description when read with the accompanying figures. It isnoted that, in accordance with the common practice in the industry,various features are not drawn to scale. In fact, the dimensions of thevarious features may be arbitrarily increased or reduced for clarity ofdiscussion.

FIGS. 1A and 1B-1E illustrate an isometric view and cross-sectionalviews of a semiconductor device, respectively, in accordance with someembodiments.

FIG. 2 is a flow diagram of a method for fabricating a semiconductordevice with negative capacitance dielectric structures, in accordancewith some embodiments.

FIGS. 3A-6A illustrate isometric views of a semiconductor device withnegative capacitance dielectric structures at various stages of itsfabrication process, in accordance with some embodiments.

FIGS. 7A-14A, 3B-14B, 3C-14C, and 5D-6D illustrate cross-sectional viewsof a semiconductor device with negative capacitance dielectricstructures at various stages of its fabrication process, in accordancewith some embodiments.

Illustrative embodiments will now be described with reference to theaccompanying drawings. In the drawings, like reference numeralsgenerally indicate identical, functionally similar, and/or structurallysimilar elements.

DETAILED DESCRIPTION

The following disclosure provides many different embodiments, orexamples, for implementing different features of the provided subjectmatter. Specific examples of components and arrangements are describedbelow to simplify the present disclosure. These are, of course, merelyexamples and are not intended to be limiting. For example, the formationof a first feature over a second feature in the description that followsmay include embodiments in which the first and second features areformed in direct contact, and may also include embodiments in whichadditional features may be formed between the first and second features,such that the first and second features may not be in direct contact. Asused herein, the formation of a first feature on a second feature meansthe first feature is formed in direct contact with the second feature.In addition, the present disclosure may repeat reference numerals and/orletters in the various examples. This repetition does not in itselfdictate a relationship between the various embodiments and/orconfigurations discussed.

Spatially relative terms, such as “beneath,” “below,” “lower,” “above,”“upper,” and the like may be used herein for ease of description todescribe one element or feature's relationship to another element(s) orfeature(s) as illustrated in the figures. The spatially relative termsare intended to encompass different orientations of the device in use oroperation in addition to the orientation depicted in the figures. Theapparatus may be otherwise oriented (rotated 90 degrees or at otherorientations) and the spatially relative descriptors used herein maylikewise be interpreted accordingly.

It is noted that references in the specification to “one embodiment,”“an embodiment,” “an example embodiment,” “exemplary,” etc., indicatethat the embodiment described may include a particular feature,structure, or characteristic, but every embodiment may not necessarilyinclude the particular feature, structure, or characteristic. Moreover,such phrases do not necessarily refer to the same embodiment. Further,when a particular feature, structure or characteristic is described inconnection with an embodiment, it would be within the knowledge of oneskilled in the art to effect such feature, structure or characteristicin connection with other embodiments whether or not explicitlydescribed.

It is to be understood that the phraseology or terminology herein is forthe purpose of description and not of limitation, such that theterminology or phraseology of the present specification is to beinterpreted by those skilled in relevant art(s) in light of theteachings herein.

As used herein, the term “selectivity” refers to the ratio of the etchrates of two materials under the same etching conditions.

As used herein, the term “high-k” refers to a high dielectric constant.In the field of semiconductor device structures and manufacturingprocesses, high-k refers to a dielectric constant that is greater thanthe dielectric constant of SiO2 (e.g., greater than 3.9).

As used herein, the term “p-type” defines a structure, layer, and/orregion as being doped with p-type dopants, such as boron.

As used herein, the term “n-type” defines a structure, layer, and/orregion as being doped with n-type dopants, such as phosphorus.

In some embodiments, the terms “about” and “substantially” can indicatea value of a given quantity that varies within 5% of the value (e.g.,±1%, ±2%, ±3%, ±4%, ±5% of the value).

The fin structures discloses herein may be patterned by any suitablemethod. For example, the fin structures may be patterned using one ormore photolithography processes, including double-patterning ormulti-patterning processes. Generally, double-patterning ormulti-patterning processes combine photolithography and self-alignedprocesses, allowing patterns to be created that have, for example,pitches smaller than what is otherwise obtainable using a single, directphotolithography process. For example, in one embodiment, a sacrificiallayer is formed over a substrate and patterned using a photolithographyprocess. Spacers are formed alongside the patterned sacrificial layerusing a self-aligned process. The sacrificial layer is then removed, andthe remaining spacers may then be used to pattern the fin structures.

The present disclosure provides example negative capacitance (NC)dielectric structures in field effective transistor (FET) devices (e.g.,gate-all-around (GAA) FETs, finFETs, GAA finFETs, or planar FETs) in asemiconductor device and/or in an integrated circuit (IC) and examplemethods for fabricating the same.

Negative capacitance (NC) can be defined as a decrease in voltage acrossa capacitor with an increase in charge on the capacitor. Negativecapacitance can be found in dielectric and/or ferroelectric materials.The NC of dielectric and/or ferroelectric materials can be applied todevices for improved device performance.

The example methods in the present disclosure can form FET deviceshaving gate structures with NC material based gate dielectric layers(also referred to as NC gate dielectric layers). In some embodiments,the NC materials can include a dielectric material with ferroelectricproperties, a dielectric material in orthorhombic phase (e.g., hafniumoxide (HfO₂) in orthorhombic phase), and/or a dielectric material (e.g.,HfO₂) doped with one or more metals, such as aluminum (Al), calcium(Ca), cerium (Ce), dysprosium (Dy), Erbium (Er), gadolinium (Gd),germanium (Ge), lanthanum (La), scandium (Sc), silicon (Si), strontium(Sr), stannum (Sn), yttrium (Y), zirconium (Zr), or a combinationthereof. The NC gate dielectric layers can reduce subthreshold swing(SS) through internal voltage amplification mechanism and increasechannel on-current to off-current (Ion/Ioff) ratio of the devices. TheSS can represent the current on-off switching characteristics of adevice, and can be a factor in determining the switching speed of thedevice. The reduction of SS in the FET devices can achieve faster deviceoperation along with lower switching energy, and can effectively scaledown the supply voltage and significantly lower the power consumption inthese FET devices.

In some embodiments, the example methods can form first and second NCspacer structures between gate structures and source/drain (S/D) regionsof the FET devices to reduce parasitic capacitances between them. Theparasitic capacitance can arise from an electrical coupling between onesignal line and another signal line or a signal line and the substratesof the FET devices and can negatively impact device performance at highfrequencies. In some embodiments, the first NC spacer structure can bedisposed between an epitaxial S/D region and a portion of the gatestructure of a GAA finFET and can include an NC material baseddielectric layer, a non-NC material based dielectric layer, and anair-gap. In some embodiments, the second NC spacer structure can bedisposed between a S/D contact structure and the gate structure of theGAA finFET and can include an NC material based dielectric layer and anitride layer.

A semiconductor device 100 having finFETs 102A-102B is described withreference to FIGS. 1A-1E, according to some embodiments. FIG. 1Aillustrates an isometric view of semiconductor device 100, according tosome embodiments, FIG. 1B illustrates a cross-sectional view along lineB-B of semiconductor device 100 of FIG. 1A, FIG. 1C illustrates azoomed-in area C of the cross-sectional view of FIG. 1B, FIG. 1Dillustrates a zoomed-in area D of the cross-sectional view of FIG. 1C,and FIG. 1E illustrates a cross-sectional view along line E-E ofsemiconductor device 100 in FIG. 1A, according to some embodiments. Insome embodiments, finFETs 102A-102B can be both p-type finFETs (PFETs)or n-type finFETs (NFETs) or one of each conductivity type finFETs.Though two finFETs are shown in FIGS. 1A-1B, semiconductor device 100can have any number of finFETs. The discussion of elements of finFET102A-102B with the same annotations applies to each other, unlessmentioned otherwise. The isometric and cross-sectional views ofsemiconductor device 100 are shown for illustration purposes and may notbe drawn to scale.

Referring to FIGS. 1A-1B, finFETs 102A-102B can be formed on a substrate106. Substrate 106 can be a semiconductor material such as, but notlimited to, silicon. In some embodiments, substrate 106 includes acrystalline silicon substrate (e.g., wafer). In some embodiments,substrate 106 includes (i) an elementary semiconductor, such asgermanium; (ii) a compound semiconductor including silicon carbide,gallium arsenide, gallium phosphide, indium phosphide, indium arsenide,and/or indium antimonide; (iii) an alloy semiconductor including silicongermanium carbide, silicon germanium, gallium arsenic phosphide, galliumindium phosphide, gallium indium arsenide, gallium indium arsenicphosphide, aluminum indium arsenide, and/or aluminum gallium arsenide;or (iv) a combination thereof. Further, substrate 106 can be dopeddepending on design requirements (e.g., p-type substrate or n-typesubstrate). In some embodiments, substrate 106 can be doped with p-typedopants (e.g., boron, indium, aluminum, or gallium) or n-type dopants(e.g., phosphorus or arsenic).

Semiconductor device 100 can further include a fin structure 108extending along an X-axis and through finFETs 102A-102B. Fin structure108 can include a fin base portion 108A and a fin top portion 108Bdisposed on fin base portion 108A. In some embodiments, fin base portion108A can include material similar to substrate 106. Fin base portion108A can be formed from a photolithographic patterning and an etching ofsubstrate 106. In some embodiments, fin top portion 108B can includestacked fin portions 108B₁ and 108B₂ and epitaxial regions 110. Each ofstacked fin portions 108B₁ and 108B₂ can include a stack ofsemiconductor layers 122, which can be in the form of nanowires. Eachsemiconductor layer 122 can form a channel region underlying gatestructures 112 of finFETs 102A-102B.

In some embodiments, semiconductor layers 122 can include semiconductormaterials similar to or different from substrate 106. In someembodiments, each of semiconductor layer 122 can include silicongermanium (SiGe) with Ge in a range from about 25 atomic percent toabout 50 atomic percent with any remaining atomic percent being Si orcan include Si without any substantial amount of Ge.

The semiconductor materials of semiconductor layers 122 can be undopedor can be in-situ doped during their epitaxial growth process using: (i)p-type dopants, such as boron, indium, or gallium; and/or (ii) n-typedopants, such as phosphorus or arsenic. For p-type in-situ doping,p-type doping precursors, such as diborane (B₂H₆), boron trifluoride(BF₃), and/or other p-type doping precursors can be used. For n-typein-situ doping, n-type doping precursors, such as phosphine (PH₃),arsine (AsH₃), and/or other n-type doping precursor can be used.Semiconductor layers 122 can have respective vertical dimensions 122 t(e.g., thicknesses) along a Z-axis, each ranging from about 6 nm toabout 10 nm. Other dimensions and materials for semiconductor layers 122are within the scope and spirit of this disclosure. Though four layersof semiconductor layers 122 are shown in FIGS. 1A-1B, semiconductordevice 100 can have any number of semiconductor layers 122.

Referring to FIGS. 1A-1B, epitaxial fin regions 110 can be grown onregions of base fin portion 108A that do not underlie gate structures112. In some embodiments, epitaxial fin regions 110 can have anygeometric shape, for example, polygonal or circular. Epitaxial finregions 110 can include an epitaxially-grown semiconductor material. Insome embodiments, the epitaxially grown semiconductor material is thesame material as the material of substrate 106. In some embodiments, theepitaxially-grown semiconductor material includes a different materialfrom the material of substrate 106. The epitaxially-grown semiconductormaterial can include: (i) a semiconductor material, such as germanium orsilicon; (ii) a compound semiconductor material, such as galliumarsenide and/or aluminum gallium arsenide; or (iii) a semiconductoralloy, such as silicon germanium and/or gallium arsenide phosphide.

Referring to FIG. 1C, in some embodiments, epitaxial fin regions 110 caneach have a height 110 t. In some embodiments, epitaxial fin height 110t can be equal to or different from vertical dimension H₂ of fin topportion 108B. In some embodiments, epitaxial fin height 110 t can rangefrom about 10 nm to about 100 nm. Other dimensions for epitaxial finregions 110 are within the scope and spirit of this disclosure.

In some embodiments, epitaxial fin regions 110 can be grown by (i)chemical vapor deposition (CVD), such as low pressure CVD (LPCVD),atomic layer CVD (ALCVD), ultrahigh vacuum CVD (UHVCVD), reducedpressure CVD (RPCVD), or any suitable CVD; (ii) molecular beam epitaxy(MBE) processes; (iii) any suitable epitaxial process; or (iv) acombination thereof. In some embodiments, epitaxial fin regions 110 canbe grown by an epitaxial deposition/partial etch process, which repeatsthe epitaxial deposition/partial etch process at least once. Suchrepeated deposition/partial etch process is also called a cyclicdeposition-etch (CDE) process.

Epitaxial fin regions 110 can be p-type or n-type for PFETs 102A-102B orNFETs 102A-102B, respectively. In some embodiments, epitaxial finregions 110 of finFET 102A and finFET 102B can be the same or oppositedoping type with respect to each other. P-type epitaxial fin regions 110can include SiGe and can be in-situ doped during an epitaxial growthprocess using p-type dopants, such as boron, indium, or gallium. Forp-type in-situ doping, p-type doping precursors such as, but not limitedto, diborane (B₂H₆), boron trifluoride (BF₃), and/or other p-type dopingprecursors can be used. In some embodiments, n-type epitaxial finregions 110 can include Si and may be in-situ doped during an epitaxialgrowth process using n-type dopants, such as phosphorus or arsenic. Forn-type in-situ doping, n-type doping precursors such as, but not limitedto, phosphine (PH₃), arsine (AsH₃), and/or other n-type doping precursorcan be used.

Referring to FIG. 1B, epitaxial fin regions 110 can form source/drain(S/D) regions of finFETs 102A-102B. Each of the channel regions insemiconductor layers 122 of stacked fin portions 108B₁ and 108B₂ can beinterposed between a pair of S/D regions. Though finFETs 102A-102B areshown to have fin structure 108 with stacked fin portions 108B₁ and108B₂ on fin base portion 108A, other fin structures (e.g., a singlelayered fin structure etched from or epitaxially grown on substrate 106)of finFETs 102A and/or 102B are within the scope and spirit of thisdisclosure.

In some embodiments, fin base portion 108A and fin top portion 108B canhave respective vertical dimensions H₁ and H₂ (e.g., heights) along aZ-axis, each ranging from about 40 nm to about 60 nm. Verticaldimensions H₁ and H₂ can be equal to or different from each other andcan have values such that the sum of H₁ and H₂ (i.e., total height H_(T)of fin structure 108) ranges from about 80 nm to about 120 nm. In someembodiments, fin structure 108 can have a horizontal dimension L₁ (e.g.,length) along an X-axis ranging from about 100 nm to about 1 μm.Horizontal dimension L₁ of fin structure 108 can be at least 100 nm toprevent the relaxation of strain in fin structure 108, and consequently,prevent the relaxation of strain in channel regions formed insemiconductor layers 122 under gate structures 112. Other dimensions andmaterials for fin structure 108 are within the scope and spirit of thisdisclosure.

In some embodiments, finFETs 102A-102B can further include gatestructures 112 and spacers 114.

Referring to FIGS. 1A-1E, gate structures 112 can be multi-layeredstructures and can be wrapped around stacked fin portions 108B₁ and108B₂. In some embodiments, each of semiconductor layers 122 of stackedfin portions 108B₁ and 108B₂ can be wrapped around by one of gatestructures 112 or one or more layers of one of gate structures 112 forwhich gate structures 112 can be also referred to as “gate-all-around(GAA) structures” or “horizontal gate-all-around structures” and finFETs102A-102B can be also referred to as “GAA FETs” or “GAA finFETs.”

Each gate structure 112 can include a gate dielectric layer 112A havinga negative capacitance (NC) material (also referred to as NC gatedielectric layer 112A) disposed on semiconductor layers 122 and a gateelectrode 112B disposed on NC gate dielectric layer 112A. As shown inFIG. 1E, NC gate dielectric layer 112A can be wrapped around eachsemiconductor layer 122, and thus, electrically isolate semiconductorlayers 122 from each other and from conductive gate electrode 112B toprevent shorting between gate structures 112 and S/D regions duringoperation of finFETs 102A-102B.

Referring to FIG. 1D, each NC gate dielectric layer 112A can have athickness 112 t ranging from about 2 nm to about 3 nm. In someembodiments, NC gate dielectric layer 112A can include a dielectricmaterial with ferroelectric properties, such as hafnium oxide (HfO₂),hafnium aluminum oxide (HfAlO), hafnium silicate (HfSiO), hafniumzirconium oxide (HfZrO), or the like. NC gate dielectric layer 112A canbe formed using sputtering, PVD, CVD, or other suitable processes.Though some NC materials of NC gate dielectric layer 112A includes thesame atomic elements as high-k dielectric materials, NC gate dielectriclayer 112A can have different properties than high-k dielectricmaterials. For example, the NC material of NC gate dielectric layer 112Acan have a resistivity lower than the respective high-k dielectricmaterial that has the same type of atomic elements.

In addition, the negative capacitance property of the dielectricmaterial of NC gate dielectric layer 112A can be affected by variousfactors including, and not limited to, the atomic elements of thedielectric material, the atomic percentage of the atomic elements,and/or the phase of the crystal structure of the dielectric material.The phase can also be affected by the deposition process conditions andpost-treatment conditions for forming NC gate dielectric layer 112A.Thus, a dielectric material having the same atomic elements and/or thesame atomic percentages of the atomic elements as the dielectricmaterial of NC gate dielectric layer 112A may not exhibit negativecapacitance property, and thus, many not be considered as an NCmaterial.

In some embodiments, NC gate dielectric layer 112A can include a high-kor low-k dielectric material in orthorhombic phase (e.g., high-k HfO₂ inorthorhombic phase) and/or a high-k or low-k dielectric materialsubjected to one or more treatment method, such as doping, stressing,and/or thermal annealing. In some embodiments, NC gate dielectric layer112A can include stable orthorhombic phase NC dielectric material formedby doping and/or thermal annealing HfO₂ with metals, such as aluminum(Al), calcium (Ca), cerium (Ce), dysprosium (Dy), Erbium (Er),gadolinium (Gd), germanium (Ge), lanthanum (La), scandium (Sc), silicon(Si), strontium (Sr), stannum (Sn), yttrium (Y), zirconium (Zr), and/ora combination thereof. Other materials and formation methods for NCmaterial of NC gate dielectric layer 112A are within the scope andspirit of this disclosure.

In some embodiments, NC gate dielectric layer 112A can include NCdielectric material formed by doping HfO₂ with (i) about 2 atomicpercent to about 15 atomic percent of Al; (ii) about 2 atomic percent toabout 26 atomic percent of Ge; (iii) about 2 atomic percent to about 25atomic percent of La; (iv) about 2 atomic percent to about 24 atomicpercent of Si; (v) about 2 atomic percent to about 30 atomic percent ofSr; (vi) about 1 atomic percent to about 40 atomic percent of Y; and/or(vii) about 3 atomic percent to about 60 atomic percent of Zr. Thethermal annealing temperature can range from about 700° C. to about1000° C. The doping of HfO₂ can be followed by thermal annealing to formthe NC dielectric material for NC gate dielectric layer 112A. In someembodiments, the thermal annealing temperature can range from about 700°C. to about 900° C. (e.g., about 850° C.). Other materials and formationmethods for NC material of NC gate dielectric layer 112A are within thescope and spirit of this disclosure.

In some embodiments, NC gate dielectric layer 112A can include a singlelayer or a stack of insulating material layers in addition to the layerof NC material. In some embodiments, NC gate dielectric layer 112A caninclude (i) a layer of silicon oxide, silicon nitride, and/or siliconoxynitride formed by CVD, atomic layer deposition (ALD), physical vapordeposition (PVD), e-beam evaporation, or other suitable processes, (ii)a high-k dielectric material, such as HfO₂, titanium oxide (TiO₂),tantalum oxide (Ta₂O₃), HfSiO₄, zirconium oxide (ZrO₂), zirconiumsilicate (ZrSiO₂), (iii) a high-k dielectric material having oxides oflithium (Li), beryllium (Be), magnesium (Mg), Ca, Sr, Sc, Y, Zr, Al, La,Ce, praseodymium (Pr), neodymium (Nd), samarium (Sm), europium (Eu), Gd,terbium (Tb), Dy, holmnium (Ho), Er, thulium (Tin), ytterbium (Yb), orlutetium (Lu), or (iv) a combination thereof. High-k dielectric layerscan be formed by ALD and/or other suitable methods. Other materials andformation methods for NC material of NC gate dielectric layer 112A arewithin the scope and spirit of this disclosure.

NC gate dielectric layers 112A of finFETs 102A-102B can reducesubthreshold swing through internal voltage amplification mechanism, andthus scale down the supply voltage and lower power dissipation offinFETs 102A-102B. The negative capacitance effect of gate dielectriclayers 112A can overcome the lower limit of voltage operation andachieve faster operation along with lower switching energy for finFETs102A-102B.

In some embodiments, each gate electrode 112B can include a gate barrierlayer (not shown), a gate work function layer 130, and a gate metal filllayer 132. As shown in FIG. 1E, each semiconductor layers 122 of stackedfin portions 108B₁ and 108B₂ can be wrapped around by one of gatebarrier layers and one of gate work function layers 130. Depending onthe spaces between adjacent semiconductor layers 122 and the thicknessesof the layers of gate structures 112, semiconductor layers 122 can bewrapped around by one or more layers of gate electrodes 112B filling thespaces between adjacent semiconductor layers 122. Though FIG. 1E showsgate metal fill layers 132 partially wrapped around semiconductor layers122, gate metal fill layers 132 can also wrap around semiconductorlayers 122 to fill the spaces between adjacent semiconductor layers 122(not shown), according to some embodiments.

In some embodiments, gate barrier layers can serve as nucleation layersfor subsequent formation of gate work function layers 130 and/or canhelp to prevent substantial diffusion of metals (e.g., Al) from gatework function layers 130 to underlying layers (e.g., NC gate dielectriclayer 112A or oxide layers). Each gate barrier layer can includetitanium (Ti), tantalum (Ta), titanium nitride (TiN), tantalum nitride(TaN), or other suitable diffusion barrier materials and can be formedby ALD, PVD, CVD, or other suitable metal deposition processes. In someembodiments, gate barrier layers can include substantially fluorine-freemetal or metal-containing film and can be formed by ALD or CVD using oneor more non-fluorine based precursors. The substantially fluorine-freemetal or fluorine-free metal-containing film can include an amount offluorine contaminants less than 5 atomic percent in the form of ions,atoms, and/or molecules. In some embodiments, each gate barrier layercan have a thickness ranging from about 1 nm to about 10 nm. Othermaterials, formation methods and thicknesses for gate barrier layers arewithin the scope and spirit of this disclosure.

Each gate work function layer 130 can include a single metal layer or astack of metal layers. The stack of metal layers can include metalshaving work function values equal to or different from each other. Insome embodiments, each gate work function layer 130 can include aluminum(Al), copper (Cu), tungsten (W), titanium (Ti), tantalum (Ta), titaniumnitride (TiN), tantalum nitride (TaN), nickel silicide (NiSi), cobaltsilicide (CoSi), silver (Ag), tantalum carbide (TaC), tantalum siliconnitride (TaSiN), tantalum carbon nitride (TaCN), titanium aluminum(TiAl), titanium aluminum nitride (TiAlN), tungsten nitride (WN), metalalloys, and/or combinations thereof. In some embodiments, each gate workfunction layer 130 can include Al-doped metal, such as Al-doped Ti,Al-doped TiN, Al-doped Ta, or Al-doped TaN. Gate work function layers130 can be formed using a suitable process such as ALD, CVD, PVD,plating, or combinations thereof. In some embodiments, each gate workfunction layer 130 can have a thickness ranging from about 2 nm to about15 nm. Other materials, formation methods and thicknesses for gate workfunction layers 130 are within the scope and spirit of this disclosure.

Each gate metal fill layer 132 can include a single metal layer or astack of metal layers. The stack of metal layers can include metalsdifferent from each other. In some embodiments, each gate metal filllayer 132 can include a suitable conductive material, such as Ti, silver(Ag), Al, titanium aluminum nitride (TiAlN), tantalum carbide (TaC),tantalum carbo-nitride (TaCN), tantalum silicon nitride (TaSiN),manganese (Mn), Zr, titanium nitride (TiN), tantalum nitride (TaN),ruthenium (Ru), molybdenum (Mo), tungsten nitride (WN), copper (Cu),tungsten (W), cobalt (Co), nickel (Ni), titanium carbide (TiC), titaniumaluminum carbide (TiAlC), tantalum aluminum carbide (TaAlC), metalalloys, and/or combinations thereof. Gate metal fill layers 132 can beformed by ALD, PVD, CVD, or other suitable deposition processes. Othermaterials and formation methods for gate metal fill layers 132 arewithin the scope and spirit of this disclosure. Though gate structures112 of finFETs 102A-102B are shown to be similar, finFETs 102A-102B canhave gate structures with materials and/or electrical properties (e.g.,threshold voltage, work function value) different from each other. Also,though gate structures 112 are shown to have horizontal GAA structures,other gate structures (e.g., vertical GAA structures or gate structureswithout GAA structures) are within the scope and spirit of thisdisclosure.

Referring to FIGS. 1A-1B, spacers 114 (also referred to as non-NCmaterial based dielectric layers 114) can form sidewalls of gatestructures 112 and be in physical contact with portions of NC gatedielectric layers 112A, according to some embodiments. Spacers 114 caninclude insulating material, such as silicon oxide, silicon nitride, alow-k material, or a combination thereof. Spacer 114 can include asingle layer or a stack of insulating layers. Spacers 114 can have alow-k material with a dielectric constant less than about 3.9 (e.g.,about 3.5, about 3.0, or about 2.8). In some embodiments, spacers 114can include a material composed of silicon, oxygen, carbon, and/ornitrogen. The concentrations of silicon, oxygen, carbon, and nitrogen inthe material for spacers 114 can depend on the desired dielectricconstant for spacers 114. Varying concentrations of silicon, oxygen,carbon, and nitrogen in the material can vary the desired dielectricconstant of spacers 114. In some embodiments, each spacer 114 caninclude a layer of silicon oxycarbonitride (SiOCN), a layer of siliconcarbon nitride (SiCN), a layer of silicon oxide carbide (SiOC), or acombination thereof. In some embodiments, each spacer 114 can include astack of a SiOCN layer disposed on a SiOC layer, which is disposed on aSiOCN layer.

In some embodiments, the layer of SiOCN can include siliconconcentration ranging from about 25 atomic percent to about 35 atomicpercent, oxygen concentration ranging from about 30 atomic percent toabout 50 atomic percent, carbon concentration ranging from about 1atomic percent to about 15 atomic percent, and nitrogen concentrationranging from about 8 atomic percent to about 25 atomic percent.

In some embodiments, the layer of SiCN can include silicon concentrationranging from about 35 atomic percent to about 40 atomic percent, carbonconcentration ranging from about 5 atomic percent to about 10 atomicpercent, and nitrogen concentration ranging from about 40 atomic percentto about 50 atomic percent.

In some embodiments, each spacer 114 can have a thickness S_(t) rangingfrom about 5 nm to about 12 nm. Other materials and dimensions forspacers 114 are within the scope and spirit of this disclosure.

Referring to FIGS. 1C-1D, inner spacer structures 121 (also referred toas first NC spacer structures 121) can be formed at fin regions 119between epitaxial fin regions 110 and portions of gate structures 112,which are between adjacent semiconductor layers 122, according to someembodiments. Each inner spacer structure 121 can include an NC materialbased dielectric layer 123 (also referred to as NC dielectric layer123), a non-NC material based dielectric layer 127 (also referred to asnon-NC dielectric layer 127), and/or an air gap 129. Non-NC dielectriclayer 127 and air gap 129 can be enclosed by NC dielectric layer 123 andepitaxial fin region 110. NC dielectric layer 123 can have a NC materialsimilar to NC gate dielectric layer 112A, or a different NC materialfrom the NC materials described above.

Non-NC dielectric layer 127 can have a low-k material with a dielectricconstant less than about 3.9 (e.g., about 3.5, about 3.0, or about 2.8)or a high-k material with a dielectric constant ranging from about 4 toabout 7. In some embodiments, NC dielectric layers 123 and non-NCdielectric layers 127 can have dielectric constant equal to or differentfrom each other. Non-NC dielectric layer 127 can include a single layeror a stack of dielectric layers. In some embodiments, non-NC dielectriclayers 127 can include a non-NC dielectric material composed of silicon,oxygen, carbon, and/or nitrogen. The concentrations of silicon, oxygen,carbon, and nitrogen in the non-NC dielectric material for non-NCdielectric layers 127 can depend on the desired dielectric constant fornon-NC dielectric layers 127. Varying concentrations of silicon, oxygen,carbon, and nitrogen in the non-NC dielectric material can vary thedesired dielectric constant of non-NC dielectric layers 127. The non-NCdielectric material can include SiOC, SiCN, SiOCN, SiN, silicon oxide(SiO_(x)), silicon oxynitride (SiO_(y)N) and/or a combination thereof,deposited by ALD, flowable CVD (FCVD), or other suitable methods. Insome embodiments, non-NC dielectric layer 127 can include SiN formed ata temperature in a range from about 450° C. to about 570° C. using ALD.

In some embodiments, the non-NC dielectric material can include a layerof SiOCN, which can have a silicon concentration higher than carbonconcentration. For example, the silicon concentration can be about 2 to10 times higher than the carbon concentration and the siliconconcentration can range from about 25 atomic percent to about 35 atomicpercent and the carbon concentration can range from about 5 atomicpercent to about 15 atomic percent. In some embodiments, the non-NCdielectric material can include a layer of SiOC, which can have asilicon concentration higher than carbon concentration. For example, thesilicon concentration can be about 2 to 5 times higher than the carbonconcentration and the silicon concentration can range from about 25atomic percent to about 30 atomic percent and the carbon concentrationcan range from about 8 atomic percent to about 10 atomic percent.

In some embodiments, the non-NC dielectric material can include a layerof SiCN which can have a silicon concentration higher than carbonconcentration. For example, the silicon concentration can be about 15 to20 times higher than the carbon concentration and the siliconconcentration can range from about 30 atomic percent to about 40 atomicpercent and the carbon concentration can range from about 1 atomicpercent to about 4 atomic percent. In some embodiments, the non-NCdielectric material can include an oxygen concentration at least about1.2 to 2 times higher than other elements in the non-NC dielectricmaterial.

Air gaps 129 can be filled with air, and the dielectric constant can beabout 1. In some embodiments, inner spacer structures 121 may not haveair gaps 129. In some embodiments, NC dielectric layer 123 can have adimension 123 t (e.g., thickness) along an X-axis or a Z-axis rangingfrom about 2 nm to about 3 nm, non-NC dielectric layer 127 can have adimension 127 t (e.g., thickness) along an X-axis ranging from about 3nm to about 6 nm, and air gap 129 can have a dimension 129 t (e.g.,thickness) along an X-axis ranging from about 2 nm to about 3 nm. Thedielectric constant of each inner spacer structure 121 can be tuned byvarying thicknesses 123 t, 127 t, and/or 129 t. In some embodiments, aratio between thicknesses 127 t and 129 t can range from about 1 toabout 4 and a ratio between thicknesses 127 t and 123 t can range fromabout 1 to about 4. Other materials and dimensions for inner spacerstructures 121 are within the scope and spirit of this disclosure.

Non-NC dielectric layer 127 and air gap 129 can reduce the parasiticcapacitance of finFETs 102-102B. NC dielectric layer 123 can furtherreduce the parasitic capacitance with higher dielectric constant andwithout increasing current leakage.

Referring to FIGS. 1A-1E, semiconductor device 100 can further includean etch stop layer (ESL) (not shown), an interlayer dielectric (ILD)layer 118, and shallow trench isolation (STI) regions 138. ESL can beconfigured to protect gate structures 112 and/or epitaxial fin regions110. This protection can be provided, for example, during formation ofILD layer 118 and/or S/D contact structures (not shown in FIGS. 1A-1E;shown in FIG. 14C). ESL can be disposed on sidewalls of spacers 114. Insome embodiments, ESL can include, for example, silicon nitride(SiN_(x)), silicon oxide (SiO_(x)), silicon oxynitride (SiON), siliconcarbide (SiC), silicon carbo-nitride (SiCN), boron nitride (BN), siliconboron nitride (SiBN), silicon carbon boron nitride (SiCBN), or acombination thereof. In some embodiments, ESL can include siliconnitride or silicon oxide formed by low pressure chemical vapordeposition (LPCVD), plasma enhanced chemical vapor deposition (PECVD),chemical vapor deposition (CVD), or silicon oxide formed by ahigh-aspect-ratio process (HARP). In some embodiments, ESL can have athickness ranging from about 3 nm to about 30 nm. Other materials,formation methods, and thicknesses for ESL are within the scope andspirit of this disclosure.

ILD layer 118 can be disposed on ESL and can include a dielectricmaterial deposited using a deposition method suitable for flowabledielectric materials (e.g., flowable silicon oxide, flowable siliconnitride, flowable silicon oxynitride, flowable silicon carbide, orflowable silicon oxycarbide). For example, flowable silicon oxide can bedeposited using flowable CVD (FCVD). In some embodiments, the dielectricmaterial is silicon oxide. In some embodiments, ILD layer 118 can have athickness 118 t in a range from about 50 nm to about 200 nm. Othermaterials, thicknesses, and formation methods for ILD layer 118 arewithin the scope and spirit of this disclosure.

STI regions 138 can be configured to provide electrical isolationbetween finFETs 102A-102B with fin structure 108 and neighboring finFETswith different fin structures (not shown) on substrate 106 and/orneighboring active and passive elements (not shown) integrated with ordeposited on substrate 106. In some embodiments, STI regions 138 caninclude first and second protective liners 138A-138B and an insulatinglayer 138C disposed on second protective liner 138B. In someembodiments, insulating layer 138C can include silicon oxide, siliconnitride, silicon oxynitride, fluorine-doped silicate glass (FSG), alow-k dielectric material, and/or other suitable insulating materials.In some embodiments, STI regions 138 can have a vertical dimension 138_(H) (e.g., height) along a Z-axis ranging from about 40 nm to about 60nm. In some embodiments, vertical dimension 138 _(H) can be half of thetotal height H_(T) of fin structure 108.

Based on the disclosure herein, it will be recognized thatcross-sectional shapes of semiconductor device 100 and its elements(e.g., fin structure 108, gate structures 112, epitaxial fin regions110, spacers 114, inner spacer structures 121, and/or STI regions 138)are illustrative and are not intended to be limiting.

FIG. 2 is a flow diagram of an example method 200 for fabricatingsemiconductor device 100, according to some embodiments. Forillustrative purposes, the operations illustrated in method 200 will bedescribed with reference to the example fabrication process forfabricating semiconductor device 100 as illustrated in FIGS. 3A-14A,3B-14B, 3C-14C, and 5D-6D. FIGS. 3A-6A are isometric views ofsemiconductor device 100 at various stages of its fabrication, accordingto some embodiments. FIGS. 3B-6B, 3C-6C and 5D-6D are cross-sectionalviews along lines B-B, C-C, and D-D of respective structures of FIGS.3A-6A, respectively, according to some embodiments. FIGS. 7A-14A, 14Band 14C are cross-sectional views along an X-axis of semiconductordevice 100 at various stages of its fabrication and along line B-B ofthe structure of FIG. 6A after further processing, according to someembodiments. FIGS. 7B-13B are zoomed-in views of respective structuresof FIGS. 7A-13A, according to some embodiments. FIGS. 7C-13C arecross-sectional views along line C-C of respective structures of FIGS.7A-13A, according to some embodiments. Operations can be performed in adifferent order or not performed depending on specific applications. Itshould be noted that method 200 may not produce a complete semiconductordevice 100. Accordingly, it is understood that additional processes canbe provided before, during, and after method 200, and that some otherprocesses may only be briefly described herein. Elements in FIGS.3A-14A, 3B-14B, 3C-14C, and 5D-6D with the same annotations as elementsin FIGS. 1A-1E are described above.

In operation 205, a fin structure is formed on a substrate. For example,fin structure 108 with fin base portion 108A and fin top portion 108Bcan be formed on substrate 106 as described with reference to FIGS.3A-3C. The formation of fin structure 108 can include the formation offin base portion 108A and fin top portion 108B* on substrate 106 asshown in FIGS. 3A-3C. Subsequent processing of fin top portion 108B*,described below, can form fin top portion 108B as described withreference to FIGS. 1A-1E.

Fin top portion 108B* can include first and second semiconductor layers320 and 122 stacked in an alternating configuration. Each of first andsecond semiconductor layers 320 and 122 can be epitaxially grown on itsunderlying layer and can include semiconductor materials different fromeach other. In some embodiments, first and second semiconductor layers320 and 122 can include semiconductor materials similar to or differentfrom substrate 106. In some embodiments, first and second semiconductorlayers 320 and 122 can include semiconductor materials with oxidationrates and/or etch selectivity different from each other. In someembodiments, each of first and second semiconductor layers 320 and 122can include silicon germanium (SiGe) with Ge in a range from about 25atomic percent to about 50 atomic percent with any remaining atomicpercent being Si or can include Si without any substantial amount of Ge.

First and/or second semiconductor layers 320 and 122 can be undoped orcan be in-situ doped during their epitaxial growth process using (i)p-type dopants, such as boron, indium, or gallium; and/or (ii) n-typedopants, such as phosphorus or arsenic. For p-type in-situ doping,p-type doping precursors, such as diborane (B₂H₆), boron trifluoride(BF₃), and/or other p-type doping precursors can be used. For n-typein-situ doping, n-type doping precursors, such as phosphine (PH₃),arsine (AsH₃), and/or other n-type doping precursor can be used. Firstand second semiconductor layers 320 and 122 can have respective verticaldimensions 320 t and 122 t (e.g., thicknesses) along a Z-axis, eachranging from about 6 nm to about 10 nm. Vertical dimensions 320 t and122 t can be equal to or different from each other. Though four layersof semiconductor layers 320 and 122 are shown in FIGS. 3A-3C,semiconductor device 100 can have any number of semiconductor layers 320and 122.

The formation of fin base portion 108A and fin top portion 108B* caninclude forming a stack of materials for first and second semiconductorlayers 320 and 122 on substrate 106 and etching a portion of substrate106 and the stack of materials through patterned hard mask layers 340and 342 formed on the stack of materials. In some embodiments, hard masklayer 340 can be a thin film including silicon oxide formed, forexample, using a thermal oxidation process. In some embodiments, hardmask layer 342 can be formed of silicon nitride using, for example, lowpressure chemical vapor deposition (LPCVD) or plasma enhanced CVD(PECVD). The etching of the stack of materials can include a dry etch, awet etch process, or a combination thereof. The dry etch process caninclude using etchants having an oxygen-containing gas, afluorine-containing gas (e.g., CF₄, SF₆, CH₂F₂, CHF₃, and/or C₂F), achlorine-containing gas (e.g., Cl₂, CHCl₃, CCl₄, and/or BCl₃), abromine-containing gas (e.g., Ir and/or CHBr₃), an iodine-containinggas, other suitable etching gases and/or plasmas, or combinationsthereof. The wet etch process can include etching in dilutedhydrofluoric acid (DHF), potassium hydroxide (KOH) solution, ammonia, asolution containing hydrofluoric acid (HF), nitric acid (HNO₃), aceticacid (CH₃COOH), or combinations thereof.

In some embodiments, fin base portion 108A and fin top portion 108B* canhave respective vertical dimensions H₁ and H₂ (e.g., heights) along aZ-axis, each ranging from about 40 nm to about 60 nm. Verticaldimensions H₁ and H₂ can be equal to or different from each other andcan have values such that the sum of H₁ and H₂ (i.e., total height H_(T)of fin structure 108) ranges from about 80 nm to about 120 nm. In someembodiments, fin structure 108 can have a horizontal dimension L₁ (e.g.,length) along an X-axis ranging from about 100 nm to about 1 μm. In someembodiments, fin structure 108 can have a tapered cross-section along aYZ-plane with a horizontal dimension W₁ (e.g., width) of fin baseportion 108A along a Y-axis being greater than a horizontal dimension W₂of fin top portion 108B along a Y-axis. Horizontal dimension W₁ and W₂can range from about 6 nm to about 20 nm.

Referring to FIG. 2, in operation 210, STI regions are formed on thesubstrate. For example, as shown in FIGS. 4A-4C, STI regions 138 withfirst and second protective liners 138A-138B and insulating layer 138Ccan be formed on substrate 106. The formation of STI regions 138 caninclude (i) depositing a layer of nitride material (not shown) for firstprotective liners 138A on the structure of FIG. 3A, (ii) depositing alayer of oxide material (not shown) for second protective liners 138B onthe layer of nitride material, (iii) depositing a layer of insulatingmaterial for insulating layers 138C on the layer of oxide material, (iv)annealing the layer of insulating material for insulating layer 138C,(v) chemical mechanical polishing (CMP) the layers of nitride and oxidematerials and the annealed layer of insulating material, and (vi)etching back the polished structure to form the structure of FIG. 4A.

The layers of nitride and oxide materials can be deposited using asuitable process for depositing oxide and nitride materials, such as ALDor CVD. These layers of oxide and nitride materials can preventoxidation of the sidewalls of fin top portion 108B* during thedeposition and annealing of the insulating material for insulating layer138C.

In some embodiments, the layer of insulating material for insulatinglayer 138C can include silicon oxide, silicon nitride, siliconoxynitride, fluorine-doped silicate glass (FSG), or a low-k dielectricmaterial. In some embodiments, the layer of insulating material can bedeposited using a CVD process, a high-density-plasma (HDP) CVD process,using silane (SiH4) and oxygen (O₂) as reacting precursors. In someembodiments, layer of insulating material can be formed using asub-atmospheric CVD (SACVD) process or high aspect-ratio process (HARP),where process gases can include tetraethoxysilane (TEOS) and/or ozone(O₃).

In some embodiments, the layer of insulating material can be formed bydepositing flowable silicon oxide using a flowable CVD (FCVD) process.The FCVD process can be followed by a wet anneal process. The wet annealprocess can include annealing the deposited layer of insulating materialin steam at a temperature in a range from about 200° C. to about 700° C.for a period in a range from about 30 min to about 120 min. The wetanneal process can be followed by the CMP process to remove thepatterned hard mask layers 340 and 343 and portions of the layers ofnitride, oxide, and insulating materials for layers 138A-138C tosubstantially coplanarize top surfaces of the layers of nitride, oxide,and insulating materials with top surface 108 s (FIGS. 4A-4C) of finstructure 108. The CMP process can be followed by the etching process toetch back the layers of nitride, oxide, and insulating materials to formthe structure of FIG. 4A.

The etch back of the layers of nitride, oxide, and insulating materialscan be performed by a dry etch process, a wet etch process, or acombination thereof. In some embodiments, the dry etch process caninclude using a plasma dry etch with a gas mixture havingoctafluorocyclobutane (C₄F₈), argon (Ar), oxygen (O₂), and helium (He),fluoroform (CHF₃) and He, carbon tetrafluoride (CF₄), difluoromethane(CH₂F₂), chlorine (Cl₂), and O₂, hydrogen bromide (HBr), O₂, and He, ora combination thereof with a pressure ranging from about 1 mTorr toabout 5 mTorr. In some embodiments, the wet etch process can includeusing a diluted hydrofluoric acid (DHF) treatment, an ammonium peroxidemixture (APM), a sulfuric peroxide mixture (SPM), hot deionized water(DI water), or a combination thereof. In some embodiments, the wet etchprocess can include using ammonia (NH₃) and hydrofluoric acid (HF) asetchants and inert gases, such as Ar, xenon (Xe), He, or a combinationthereof. In some embodiments, the flow rate of HF and NH₃ used in thewet etch process can each range from about 10 sccm to about 100 sccm. Insome embodiments, the wet etch process can be performed at a pressureranging from about 5 mTorr to about 100 mTorr and a high temperatureranging from about 50° C. to about 120° C.

In some embodiments, first and second protective liners 138A-138B canhave respective thicknesses 138At and 138Bt ranging from about 1 nm toabout 2 nm. In some embodiments, STI regions 138 can have a verticaldimension 138 _(H) (e.g., height) along a Z-axis ranging from about 40nm to about 60 nm. In some embodiments, vertical dimension 138 _(H) canbe half of the total height H_(T) of fin structure 108. Other materials,formation methods, and dimensions for STI regions 138 are within thescope and spirit of this disclosure.

Referring to FIG. 2, in operation 215, a protective oxide layer isformed on the fin structure and polysilicon structures are formed on theprotective oxide layer. For example, as shown in FIGS. 5A-5D, aprotective oxide layer 134* can be formed on fin structure 108 and STIregions 138 and polysilicon structures 112A*-112B* can be formed onprotective oxide layer 134*. The formation of protective oxide layer134* can include blanket depositing a layer of oxide material on thestructure of FIG. 4A followed by a high temperature anneal process.Protective oxide layer 134* can include a suitable oxide material, suchas silicon oxide and can be blanket deposited using a suitabledeposition process, such as CVD, ALD, plasma enhanced ALD (PEALD),physical vapor deposition (PVD), or e-beam evaporation. In someembodiments, the layer of oxide material can be deposited using PEALD atan energy ranging from about 400 W to about 500 W and at a temperatureranging from about 300° C. to about 500° C. The deposition of the layerof oxide material can be followed by a dry anneal process under oxygengas flow at a temperature ranging from about 800° C. to about 1050° C.The oxygen precursor concentration can be in a range of about 0.5% toabout 5% of the total gas flow rate. In some embodiments, the annealprocess can be a flash process where the anneal time can be betweenabout 0.5 s to about 5 s.

In some embodiments, protective oxide layer 134* can have a verticaldimension 134 t* (e.g., thickness on top surface of fin structure 108)along a Z-axis and a horizontal dimension 134 s* (e.g., thickness onsidewalls of fin top portion 108B) along a Y-axis each ranging fromabout 1 nm to about 3 nm. In some embodiments, dimension 134 t* can beequal to or greater than dimension 134 s*. Other oxide materials,formation methods, and thicknesses for protective oxide layer 134* arewithin the scope and spirit of this disclosure. The presence ofprotective oxide layer 134* allow etching polysilicon from high aspectratio spaces 646 (e.g., aspect ratio greater than 1:15, 1:18, or 1:20)shown in FIG. 5A between adjacent polysilicon structures 112A*-112B*without substantially etching and/or damaging fin structure 108 duringthe formation of polysilicon structures 112A*-112B*.

In some embodiments, protective oxide layer 134* can be removed duringsubsequent gate replacement process when finFETs 102A-102B are used asnon-input/output (non-I/O) devices in core circuits (can be alsoreferred to as “logic circuits” or “memory circuits”) formed in coreregions (can be also referred to as “logic regions” or “memory regions”)of an integrated circuit (IC). In some embodiments, the non-I/O devicescan be core devices, logic devices, and/or memory devices that are notconfigured to handle the input/output voltages/currents directly. Insome embodiments, the non-I/O devices includes logic gates such as, forexample, NAND, NOR, INVERTER, or a combination thereof. In someembodiments, the non-I/O devices include a memory device, such as astatic random-access memory (SRAM) device. In some embodiments,protective oxide layer 134* may not be removed and can form a part ofgate dielectric layers of gate structures 112 when finFETs 102A-102B areused as an I/O device in peripheral circuits (e.g., 10 circuits) formedin peripheral regions (can be also referred to as “I/O regions” or “highvoltage regions”) of an IC. The I/O devices can be configured to handlethe input/output voltages/currents of the IC and to tolerate a greateramount of voltage or current swing than the non-I/O devices.

The formation of protective oxide layer 134* can be followed by theformation of polysilicon structures 112A*-112B* as shown in FIGS. 5A-5D.During subsequent processing, polysilicon structures 112A*-112B* can bereplaced in a gate replacement process to form gate structures 112 offinFETs 102A and 102B, respectively, as shown in FIG. 1A. In someembodiments, the formation of polysilicon structures 112A*-112B* caninclude blanket depositing a layer of polysilicon material on thedeposited protective oxide layer 134* and etching the layer ofpolysilicon material through a patterned hard mask layer 644 (shown inFIGS. 5A-5D) formed on the layer of polysilicon material. In someembodiments, polysilicon material can be undoped and hard mask layer 644can include an oxide layer and/or a nitride layer. The oxide layer canbe formed using a thermal oxidation process and the nitride layer can beformed by LPCVD or PECVD. Hard mask layer 644 can protect polysiliconstructures 112A*-112B* from subsequent processing steps (e.g., duringformation of spacers 114, epitaxial fin regions 110, and/or ILD layer118).

The blanket deposition of the layer of polysilicon material can includeCVD, PVD, ALD, or other suitable deposition processes. In someembodiments, etching of the deposited layer of polysilicon material caninclude a dry etch, a wet etching, or a combination thereof. In someembodiments, etching of the deposited layer of polysilicon material toform polysilicon structures 112A*-112B* can include four etching steps.The first polysilicon etch step can include using a gas mixture havinghydrogen bromide (HBr), oxygen (O₂), fluoroform (CHF₃), and chlorine(Cl₂). The second polysilicon etch step can include using a gas mixturehaving HBr, O₂, Cl₂, and nitrogen (N₂) at a pressure of about 45 mTorrto about 60 mTorr. The third polysilicon etch step can include using agas mixture having HBr, O₂, Cl₂, N₂, and argon (Ar) at a pressure ofabout 45 mTorr to about 60 mTorr. The fourth polysilicon etch step caninclude using a gas mixture having HBr, O₂, Cl₂, and N₂ at a pressure ofabout 45 mTorr to about 60 mTorr. The first polysilicon etch step canhave a higher polysilicon etch rate than the second, third, and/orfourth polysilicon etch steps. The first polysilicon etch step is usedto etch unwanted portions of the blanket deposited layer of polysiliconmaterial above fin structure 108. The second, third, and fourthpolysilicon etch steps are used to etch unwanted portions of the blanketdeposited layer of polysilicon material within high aspect ratio spaces646.

In some embodiments, vertical dimensions G_(H) of polysilicon structures112A*-112B* along a Z-axis can be in a range from about 100 nm to about150 nm. In some embodiments, horizontal dimensions G_(L) of polysiliconstructures 112A*-112B* along an X-axis can be in a range from about 3 nmto about 30 nm. Polysilicon structures 112A*-112B* can have a highaspect ratio equal to or greater than about 9, where aspect ratio is aratio of dimension G_(H) to dimension G_(L). In some embodiments,horizontal dimensions 648 along an X-axis (e.g., spacing) betweenadjacent polysilicon structures 112A*-112B* can be in a range from about40 nm to about 90 nm. The sum of a value of dimension 648 and a value ofdimension G_(L) is referred to as “one contacted poly pitch (1CPP).” Insome embodiments, horizontal dimension L₁ of fin structure along anX-axis can be at least 3CPP to prevent the relaxation of strain in finstructure 108, and consequently, prevent the relaxation of strain inchannel regions formed in stacked fin portions of second semiconductorlayers 122 under gate structures 112 as discussed above.

Referring to FIG. 2, in operation 220, spacers are formed on sidewallsof the polysilicon structures. For example, as shown in FIGS. 6A-6D,spacers 114 can be formed on sidewalls of polysilicon structures112A*-112B*. The formation of spacers 114 can include blanket depositinga layer of an insulating material (e.g., an oxide, a nitride, and/orsilicon carbon oxynitride material) on the structure of FIG. 5A by aCVD, a PVD, or an ALD process followed by photolithography and anetching process (e.g., reactive ion etching or other dry etching processusing a chlorine or fluorine based etchant). Spacers 114 can each have ahorizontal dimension S_(t) (e.g., thickness) along an X-axis rangingfrom about 5 nm to about 12 nm, according to some embodiments. Theformation of spacers 114 can be followed by the formation of oxide layer134 (shown in FIGS. 6A-6D) underlying polysilicon structures 112A*-112B*by etching protective oxide layer 134* from regions not covered bypolysilicon structures 112A*-112B* and spacers 114. The etch process caninclude a wet etch process using, for example, diluted HF.

Referring to FIG. 2, in operation 225, first negative capacitance spacerstructures are formed in the fin structure. For example, FIGS. 6A-11Cshow the formation of first NC spacer structures 121 (also referred toas inner spacer structures 121) in the fin structure 108. The formationof first NC structures 121 can include (i) vertical etch back ofportions of fin top portion 108B* that are not underlying spacers 114and polysilicon structures 112A*-112B*, (ii) formation of NC dielectriclayers 123, (iii) formation of non-NC dielectric layers 127, and (iv)formation of air gaps 129.

Referring to FIGS. 6A-6C, the vertical etch back of portions of fin topportion 108B* that are not underlying spacers 114 and polysiliconstructures 112A*-112B* can include a biased etching process to etch backthese portions of fin top portion 108B*. The biased etching process canbe performed under a pressure in a range of about 1 mTorr to about 1000mTorr, a power in range of about 50 W to about 1000 W, a bias voltage ina range of about 20 V to about 500 V, at a temperature in a range ofabout 40° C. to about 60° C., and using HBr and/or Cl₂ as etch gases.During the biased etching process, polysilicon structures 112A*-112B*can be protected from being etched by hard mask layer 644 and spacers114.

The vertical etch back of the portions of fin top portion 108B* can befollowed by a lateral etch back of portions of first semiconductorlayers 320 below polysilicon structures 112A*-112B* and spacers 114 toform recessed regions 720, as shown in FIGS. 7A-7B. The lateral etchback can be performed by a dry etching process, a wet etching process,or a combination thereof. The etching process can include a plurality ofcycles of etching and purging processes, such as about 3 to about 20cycles of etching and purging processes. The etching process in eachcycle can include using a gas mixture having hydrogen fluoride (HF),nitrogen trifluoride (NF₃), a fluorine based gas and a chlorine basedgas. The gas ratio of the gas mixture of HF and NF₃ to the fluorinebased gas can range from about 2 to about 30. The gas ratio of the gasmixture HF and NF₃ to the chlorine based gas can range from about 2 toabout 40. The purging process in each cycle can include using a gasmixture having HF and nitrogen (N₂). HF in the purging process canremove by-product and/or clean the surface of etched portions forsubsequent cycles. The purging process can be longer than the etchingprocess in each cycle.

The recessed regions 720 can each have a dimension 119 d (e.g., depth)along an X-axis in a range from about 6 nm to about 12 nm. The recessedregions 720 can extend deeper than the side of spacer 114 facingpolysilicon structures 112A*-112B*, as shown in FIGS. 7A-7B. Dimension119 d can be greater than thickness St of spacers 114 by about 0.5 nm toabout 2 nm. In some embodiments, a lateral distance 119 e between theend of recessed regions 720 and the side of spacer 114 adjacent topolysilicon gate 112B* can range from about 0.5 nm to about 2 nm. Aratio between dimension 119 d and thickness St can range from about 1.1to about 1.5 to ensure 119 d is larger than St. Etching recessed regions720 deeper than spacers 114 by lateral distance 119 e can prevent anyresidual portions of first semiconductor layer 320 under spacers 114during the removal of first semiconductor layer 320 during subsequentgate replacement process described below. Other etching methods forforming recessed regions 720 and dimensions of recessed regions 720 arewithin the scope and spirit of this disclosure.

The formation of recessed regions 720 can be followed by coating ofrecessed regions 720 with interfacial layer (not shown) and a blanketdeposition of an NC dielectric material layer 123*, as shown in FIGS.7A-7C. In subsequent processing, NC dielectric material layer 123* canform NC dielectric layer 123 as described with reference to FIGS. 1A-1E.In some embodiments, the interfacial layer (IL) can include siliconoxide with a thickness ranging from about 0.5 nm to about 1 nm and canbe formed during a chemical clean process. The IL can help the growth ofNC dielectric material layer 123* during its deposition.

NC dielectric material layer 123* can include NC materials described forNC dielectric layers 123 with reference to FIGS. 1A-1E. NC dielectricmaterial layer 123* can be blanket deposited by thermal ALD with atemperature ranging from about 180° C. to about 325° C. In someembodiments, the thermal ALD can use two precursors, one for thedeposition of HfO₂, and another for the doping of HfO₂. Thickness 123 tof NC dielectric material layer 123* can range from about 2.2 nm toabout 3 nm similar to NC dielectric layers 123. Other methods of coatingrecessed regions 720, depositing NC dielectric material layer 123*, anddimensions of IL and NC dielectric material layer 123* are within thescope and spirit of this disclosure.

The blanket deposition of NC dielectric material layer 123* can befollowed by a blanket deposition of a non-NC dielectric material layeron the structure of FIG. 7A. The blanket deposition can be followed by alateral etch of the blanket deposited non-NC dielectric material layerto form non-NC dielectric layers 127* on portions of NC dielectricmaterial layer 123* within recessed regions 720, as shown in FIGS.8A-8C. In some embodiments, the blanket deposition process can include aplurality of cycles of deposition and etch processes. In each cycle, theetch process can follow the deposition process to prevent the formationof voids within non-NC dielectric layers 127* by removing seams that canbe formed during deposition of non-NC dielectric material layer withinrecessed regions 720.

Non-NC dielectric layers 127* can include a single layer or a stack ofdielectric layers, deposited by ALD, FCVD, or other suitable methods.The etch process in each cycle of the blanket deposition process ofnon-NC dielectric material layer can include a dry etch process using agas mixture of HF and NH₃. The gas ratio of HF to NH₃ can range fromabout 1 to about 20.

Non-NC dielectric layers 127* can include a non-NC dielectric materialcomposed of silicon, oxygen, carbon, and/or nitrogen similar to thenon-NC dielectric material described for non-NC dielectric layers 127with reference to FIGS. 1A-1E. Carbon concentration can be low in thenon-NC dielectric material and range from about 1% to about 15% becausecarbon concentration in the non-NC dielectric material outside thisrange can lead to longer etch time, reduced etch selectivity between NCdielectric layer 123* and the non-NC dielectric material, and/or damageto fin structure 108.

The lateral etch process of the blanket deposited non-NC dielectricmaterial layer to form non-NC dielectric layers 127* can be performed bya dry etch process using a gas mixture of HF and NH₃. The gas ratio ofHF to NH₃ can range from about 1 to about 20. In some embodiments,non-NC dielectric layers 127* can have a dimension 127 t ₁ (e.g.,thickness) along an X-axis ranging from about 3 nm to about 12 nm. Othermethods of deposition and lateral etch process for the formation ofnon-NC dielectric layers 127*, and dimensions of non-NC dielectriclayers 127* are within the scope and spirit of this disclosure.

The formation of non-NC dielectric layers 127* can be followed by anetch process to form NC dielectric layer 123 within recessed regions720, as shown in FIGS. 9A-9C. Thus, the formation of NC dielectriclayers 123 can include the blanket deposition of NC dielectric materiallayer 123* and the etch process. In some embodiments, the etch processto form NC dielectric layer 123 can include a wet etch process usingdiluted HF (DHF).

The formation of non-NC dielectric layers 123 can be followed by alateral etch of non-NC dielectric layers 127* to form non-NC dielectriclayers 127 on NC dielectric layers 123 within recessed regions 720, asshown in FIGS. 10A-10B. Thus, the formation of non-NC dielectric layers127 can include the formation of non-NC dielectric layers 127* and thelateral etch process. In some embodiments, the lateral etch of non-NCdielectric layers 127* can include a dry etch process using a gasmixture of HF and NH₃. The gas ratio of HF to NH₃ can range from about 1to about 20. The gas ratio can be selected to have a high etchselectivity between NC dielectric layer 123 and non-NC dielectric layers127*.

After the lateral etch process, non-NC dielectric layers 127 can have athickness 127 t ranging from about 3 nm to about 6 nm. A ratio betweenthickness 127 t and dimension 119 d can range from about 0.25 toabout 1. Air gaps 129 can be formed with a thickness 129 t ranging fromabout 2 nm to about 3 nm within recessed regions 720 after the formationof epitaxial fin regions 110 on second semiconductor layers 122 asdescribed in operation 230 with reference to FIGS. 11A-11C. Theformation of NC dielectric layers 123, non-NC dielectric layers 127, andair gaps 129 can form first NC spacer structures 121 as shown in FIG.10B.

Referring to FIG. 2, in operation 230, epitaxial fin regions are formedon the fin structure and nanowires are formed between the epitaxial finregions. For example, as shown in FIGS. 11A-11C, epitaxial fin regions110 can be grown on exposed surfaces of fin base portion 108A and onexposed surfaces of second semiconductor layers 122 of the structure ofFIG. 10A. In some embodiments, a portion of epitaxial fin regions 110can be under spacers 114 and/or extend into fin base portion 108A. Insome embodiments, epitaxial fin regions 110 can be grown by (i) CVD,such as low pressure CVD (LPCVD), atomic layer CVD (ALCVD), ultrahighvacuum CVD (UHVCVD), reduced pressure CVD (RPCVD), or any suitable CVD;(ii) molecular beam epitaxy (MBE) processes; (iii) any suitableepitaxial process; or (iv) a combination thereof. In some embodiments,epitaxial fin regions 110 can be grown by an epitaxialdeposition/partial etch process, which repeats the epitaxialdeposition/partial etch process at least once. In some embodiments,epitaxial fin regions 110 can be grown by selective epitaxial growth(SEG), where an etching gas is added to promote the selective growth ofsemiconductor material on the exposed surfaces of second semiconductorlayers 122 and fin base portion 108A, but not on insulating material(e.g., insulating material of STI regions 138, of first NC spacerstructures 121 and/or of spacers 114).

In some embodiments, epitaxial fin regions 110 can be p-type or n-type.In some embodiments, p-type epitaxial fin regions 110 can include SiGeand can be in-situ doped during the epitaxial growth process usingp-type dopants, such as boron, indium, or gallium. For p-type in-situdoping, p-type doping precursors such as, but not limited to, diborane(B₂H₆), boron trifluoride (BF₃), and/or other p-type doping precursorscan be used. In some embodiments, n-type epitaxial fin regions 110 caninclude Si without any substantial amount of Ge and can be in-situ dopedduring the epitaxial growth process using n-type dopants, such asphosphorus or arsenic. For n-type in-situ doping, n-type dopingprecursors such as, but not limited to, phosphine (PH₃), arsine (AsH₃),and/or other n-type doping precursor can be used.

Each epitaxial fin region 110 can form S/D regions for finFETs 102Aand/or 102B. Second semiconductor layers 122 underlying polysiliconstructures 112A*-112B* and interposed between adjacent S/D regions canform the channel regions of finFETs 102A and/or 102B. In subsequentprocessing, gate-all-around (GAA) structures can be formed to wraparound each of the channel regions by replacing first semiconductorlayers 320 (shown in FIG. 10A) of stacked fin portions 108B₁ and 108B₂underlying polysilicon structures 112A*-112B* with one or more layers ofgate structures 112 as described below in operations 235 and 240.

In some embodiments, fin base portion 108A underlying the etchedportions of fin top portion 108B between spacers 114 can be recessedduring the vertical etch back process described in operation 225.Interfaces 848 between epitaxial fin regions 110 and fin base portion108A can be on the same plane as top surfaces of STI regions 138 or canbe below the top surface planes of STI regions 138. Other dimensions andstructures for epitaxial fin regions 110 are within the scope and spiritof this disclosure.

The formation of epitaxial regions 110 can be followed by the removal offirst semiconductor layers 320 of stacked fin portions 108B1 and 108B2to form nanowire shaped second semiconductor layers 122, as shown inFIGS. 11A-11C. First semiconductor layers 320 can be removed by anetching process performed under a pressure in a range of about 1 mTorrto about 1000 mTorr, a power in range of about 50 W to about 1000 W, abias voltage in a range of about 20 V to about 500 V, at a temperaturein a range of about 40° C. to about 60° C., and using HBr and/or Cl₂ asetch gases. Other etching methods are within the scope and spirit ofthis disclosure.

The removal of first semiconductor layers 320 can be followed by theformation of an etch stop layer (ESL) (not shown) on spacers 114 and onepitaxial fin regions 110 and the formation of ILD layer 118 on the ESLusing a deposition method suitable for flowable dielectric materials(e.g., flowable silicon oxide, flowable silicon nitride, flowablesilicon oxynitride, flowable silicon carbide, or flowable siliconoxycarbide). For example, flowable silicon oxide can be deposited usingFCVD process. The deposition process can be followed by a thermalannealing of the deposited layer of dielectric material in steam at atemperature ranging from about 200° C. to about 700° C. for a periodranging from about 30 minutes to about 120 minutes.

The formation of ILD layer 118 can be followed by the removal ofpolysilicon structures 112A*-112B* using a dry etching process (e.g.,reaction ion etching) or a wet etching process. In some embodiments, thegas etchants used in the dry etching process can include chlorine,fluorine, bromine, or a combination thereof. In some embodiments, anammonium hydroxide (NH₄OH), sodium hydroxide (NaOH), and/or potassiumhydroxide (KOH) wet etch can be used to remove polysilicon structures112A*-112B*, or a dry etch followed by a wet etch process can be used toremove polysilicon structures 112A*-112B*. The exposed portions of oxidelayer 134 can be removed using a dry etching process (e.g., reaction ionetching), a wet etching process (e.g., using diluted HF), or acombination thereof. In some embodiments, the gas etchants used in thedry etching process can include chlorine, fluorine, bromine, or acombination thereof. In some embodiments, oxide layer 134 may not beremoved.

Referring to FIG. 2, in operation 235, NC gate dielectric layers areformed on the nanowires. For example, as shown in FIGS. 12A-12C, NC gatedielectric layers 112A can be wrapped around on exposed nanowire shapedsecond semiconductor layers 122 of stacked fin portions 108B₁ and 108B₂.The formation of NC gate dielectric layers 112A can include a blanketdeposition process of an NC dielectric material layer similar to theblanket deposition process for forming NC dielectric layer 123. The NCdielectric material layer for NC gate dielectric 112A can be blanketdeposited on the structure of FIG. 11A. NC gate dielectric layer 112Acan be formed with a thickness 112 t ranging from about 2 nm to about 3nm. A ratio between thickness 122 t of semiconductor layers 122 andthickness 112 t of NC gate dielectric layer 112A can range from about 2to about 5. The NC dielectric material of NC gate dielectric layer 112Aare described above with reference to FIGS. 1A-1E. Other depositionmethods and dimensions of NC gate dielectric layers 112A are within thescope and spirit of this disclosure.

Referring to FIG. 2, in operation 240, gate electrodes are formed on NCgate dielectric layers. For example, as shown in FIGS. 1A-1D, and13A-13C, a layer of work function metal for gate work function layers130, and a layer of conductive material for gate metal fill layers 132on the layer of work function metal can be formed on NC gate dielectriclayers 112A. In some embodiments, as shown in FIG. 13C, NC gatedielectric layers 112A and gate work function layers 130 can each wraparound nanowire shaped second semiconductor layers 122 formed as aresult of the removal of first semiconductor layers 320.

The layer of work function metal for work function layers 130 caninclude Al, Cu, W, Ti, Ta, TiN, TaN, NiSi, CoSi, Ag, TaC, TaSiN, TaCN,TiAl, TiAlN, WN, metal alloys, and/or combinations thereof. In someembodiments, the layer of work function metal can include Al-dopedmetal, such as Al-doped Ti, Al-doped TiN, Al-doped Ta, or Al-doped TaN.The layer of work function metal can be deposited using a suitableprocess such as ALD, CVD, PVD, plating, or combinations thereof. Thelayer of conductive material for gate metal fill layers 132 can includeTi, Ag, Al, TiAlN, TaC, TaCN, TaSiN, Mn, Zr, TiN, TaN, Ru, Mo, WN, Cu,W, Co, Ni, TiC, TiAlC, TaAlC, metal alloys, and/or combinations thereofand can be formed by ALD, PVD, CVD, or other suitable depositionprocesses. The deposited layers of NC gate dielectric material, workfunction metal, and conductive material can be planarized by a CMPprocess to form the structure of FIG. 13A. The CMP process cansubstantially coplanarize top surfaces of NC gate dielectric layers112A, gate work function layers 130, and gate metal fill layers 132 withtop surfaces of ILD layers 118 as shown in FIG. 13A.

Referring to FIG. 2, in operation 245, second NC spacer structures areformed on the spacers on the gate structures. For example, FIGS. 14A-14Bshow the formation of second NC spacer structures 1439, which includesthe formation of NC dielectric layers 1440 and nitride layers 1442. FIG.14A is a zoomed-in view of area M of FIG. 13A after the etch back ofspacers 114, NC gate dielectric layers 112A, gate work function layers130, and gate metal fill layers 132, the formation of self-alignedcontact (SAC) dielectric layers 1444, and removal of portions of ILDlayer 118 on epitaxial fin region 110 between gate structures 112, asshown in FIG. 14A. The views of semiconductor device 100 are shown forillustration purposes and may not be drawn to scale.

The formation of NC dielectric layers 1440 can include blanketdeposition of an NC dielectric material layer 1440* on spacers 114,exposed surface of epitaxial fin region 110, and SAC dielectric layers1444 as shown in FIG. 14A. NC dielectric material layer 1440* can beblanket deposited by a thermal ALD process similar to the process usedfor the formation of NC dielectric layers 123 and/or NC gate dielectriclayer 112A described above. NC dielectric material layer 1440* can beformed with a thickness 1440 t ranging from about 2.2 nm to about 3 nm Aratio between spacer thickness St and thickness 1440 t can range fromabout 2 to about 5. NC dielectric material layer 1440* can include NCdielectric material similar to the NC dielectric material of NC gatedielectric layers 112A, or other NC dielectric materials describedabove. In some embodiments, SAC dielectric layers 1444 can include, forexample, silicon nitride (SiN_(x)), silicon oxide (SiO_(x)), siliconoxynitride (SiON), silicon carbide (SiC), silicon carbo-nitride (SiCN),boron nitride (BN), silicon boron nitride (SiBN), silicon carbon boronnitride (SiCBN), or a combination thereof.

The formation of NC dielectric material layer 1440* can be followed byformation of nitride layers 1442, as shown in FIG. 14A. In someembodiments, nitride layers 1442 can include, for example, SiN_(x),SiON, SiCN, or other suitable materials. Nitride layers 1442 can protectNC dielectric layer 1440 and/or spacers 114 during formation of S/Dcontact structures 1448 (shown in FIG. 14C). The formation of nitridelayers 1442 can include blanket deposition of a layer of nitridematerial on NC dielectric material layer 1440* using PECVD, subatmospheric chemical vapor deposition (SACVD), LPCVD, ALD, high-densityplasma (HDP), plasma enhanced atomic layer deposition (PEALD), molecularlayer deposition (MLD), plasma impulse chemical vapor deposition(PICVD), or other suitable deposition methods.

The formation of nitride layers 1442 can further include an etchingprocess to remove portions of the blanket deposited layer of nitridematerial from portion of NC dielectric material layer 1440* on epitaxialfin region 110, from top surfaces and side surfaces of NC dielectricmaterial layer 1440* on SAC dielectric layers 1444. After the etchingprocess, nitride layers 1442 can be vertically displaced from topsurfaces of NC dielectric material layer 1440* by a distance 1442 d thatcan range from about 10 nm to about 25 nm. Each nitride layers 1442 canhave a thickness ranging from about 1.5 nm to about 2 nm.

The formation of NC dielectric layers 1440 can further include removalof portions of NC dielectric material layer 1440* on top surfaces of SACdielectric layers 1444 and epitaxial fin region 110, as shown in FIG.14B. The removal process can follow the etching process to form nitridelayers 1442 and can include a dry etch process. In some embodiments,semiconductor device 100 can be formed without NC dielectric layer 1440,thus the steps of forming NC dielectric layer 1440 can be optional. Insome embodiments, a recessed region 1410 (shown in FIG. 14B) can beformed in epitaxial region 110 during the removal of NC dielectricmaterial layer 1440* from top surface of epitaxial region 110.

Referring to FIG. 2, in operation 250, S/D and gate contact structuresare formed. For example, FIG. 14C show the formation of S/D contactstructure 1448 and gate contact structure 1450 after the formation of NCdielectric layers 1440 in FIG. 14B. The formation of S/D contactstructure 1448 can include the formation of metal silicide layer 1446within recessed region 1410 of epitaxial fin region 110 and metalcontact 1447 on metal silicide layer 1446 as shown in FIG. 14C. Theformation of metal silicide layer 1446 can include deposition of a metallayer within recessed region 1410 and silicidation of the depositedmetal layer. The formation of metal contact 1447 can include depositionof a contact metal followed by CMP of the deposited contact metal. Theconductive materials for the metal layer and/or the contact metal caninclude Ti, Ag, Al, TiAlN, TaC, TaCN, TaSiN, Mn, Zr, TiN, TaN, Ru, Mo,WN, Cu, W, Co, Ni, TiC, TiAlC, TaAlC, metal alloys, and/or combinationsthereof and can be formed by ALD, PVD, CVD, or other suitable depositionprocesses.

The formation of S/D contact structure 1448 can be followed by theformation of gate contact structure 1450 on gate structure 112 as shownin FIG. 14C. In some embodiments, the formation of gate contactstructures 1450 can include forming a contact opening in which metalcontact can be deposited by ALD, PVD, CVD, or other suitable depositionprocesses followed by CMP of the deposited contact metal.

The present disclosure provides example NC dielectric layers (e.g., NCgate dielectric layers 112A, NC dielectric layers 1440 on spacers 114,and NC dielectric layers 123 between epitaxial fin regions 110 and gatestructures 112) in FET devices (e.g., finFETs 102A-102B) and/or in anintegrated circuit (IC) and example methods for fabricating the same.

The example methods can form FET devices having gate structures 112 withNC gate dielectric layers 112A. In some embodiments, the NC materialscan include a dielectric material with ferroelectric properties, adielectric material in orthorhombic phase (e.g., hafnium oxide (HfO₂) inorthorhombic phase), and/or a dielectric material (e.g., HfO2) dopedwith one or more metals, such as aluminum (Al), calcium (Ca), cerium(Ce), dysprosium (Dy), Erbium (Er), gadolinium (Gd), germanium (Ge),lanthanum (La), scandium (Sc), silicon (Si), strontium (Sr), stannum(Sn), yttrium (Y), zirconium (Zr), or a combination thereof. The NC gatedielectric layers 112A can reduce subthreshold swing (SS) throughinternal voltage amplification mechanism and increase channel on-currentto off-current (Ion/Ioff) ratio of the devices. The reduction of SS inthe FET devices can achieve faster device operation along with lowerswitching energy, and can effectively scale down the supply voltage andsignificantly lower the power consumption in these FET devices.

In some embodiments, the example methods can form first and second NCspacer structures 121 and 1439, respectively, between gate structures112 and source/drain (S/D) regions 110 of the FET devices to reduceparasitic capacitances between them. The parasitic capacitance can arisefrom an electrical coupling between one signal line and another signalline or a signal line and substrate 106 of the FET devices and cannegatively impact device performance at high frequencies. In someembodiments, the first NC spacer structure 121 can be disposed betweenepitaxial S/D region 110 and a portion of the gate structure 112 and caninclude an NC dielectric layer 123, a non-NC dielectric layer 127, andan air-gap 129. In some embodiments, the second NC spacer structure 1439can be disposed between a S/D contact structure 1448 and the gatestructure 112 and can include an NC dielectric layer 1440 and a nitridelayer 1442.

In some embodiments, a method of fabricating a semiconductor deviceincludes forming a fin structure with a fin base portion and a fin topportion on a substrate, forming a spacer structure in a first region ofthe fin top portion, and forming a gate structure on a second region ofthe fin top portion. The spacer structure includes a first NC dielectricmaterial and the gate structure includes a gate dielectric layer with asecond NC dielectric material different from the first NC dielectricmaterial.

In some embodiments, a method of fabricating a semiconductor deviceincludes forming a fin structure with a stacked fin portion and a finbase portion on a substrate, forming an epitaxial source/drain region onthe fin structure, and forming a first negative capacitance (NC)dielectric structure in a first region of the stacked fin portion. Thestacked fin portion is epitaxially grown on the fin base portion. Thefirst NC dielectric structure includes a first dielectric layer with afirst NC material. The method further includes forming gate structureson a second region of the stacked fin portion, forming a source/draincontact structure on the epitaxial source/drain region, and forming asecond NC dielectric structure between the source/drain contactstructure and the gate structures. The gate structures each includes asecond dielectric layer with the first NC material. The second NCdielectric structure includes a third dielectric layer with the first NCmaterial.

In some embodiments, a semiconductor device includes a fin structurewith a fin base portion and a fin top portion on a substrate, a spacerstructure disposed in a first region of the fin top portion, and a gatestructure disposed on a second region of the fin top portion. The spacerstructure includes a first NC dielectric material and the gate structureincludes a gate dielectric layer with a second NC dielectric materialdifferent from the first NC dielectric material.

The foregoing disclosure outlines features of several embodiments sothat those skilled in the art may better understand the aspects of thepresent disclosure. Those skilled in the art should appreciate that theymay readily use the present disclosure as a basis for designing ormodifying other processes and structures for carrying out the samepurposes and/or achieving the same advantages of the embodimentsintroduced herein. Those skilled in the art should also realize thatsuch equivalent constructions do not depart from the spirit and scope ofthe present disclosure, and that they may make various changes,substitutions, and alterations herein without departing from the spiritand scope of the present disclosure.

What is claimed is:
 1. A method of fabricating a semiconductor device,the method comprising: forming a fin structure with a fin base portionand a fin top portion on a substrate; forming a spacer structure in afirst region of the fin top portion, wherein the spacer structurecomprises a first negative capacitance (NC) dielectric layer comprisingan NC dielectric material, a non-NC dielectric structure and an air gapwithin the first NC dielectric layer; and forming a gate structure on asecond region of the fin top portion, wherein the gate structurecomprises a gate dielectric layer with a second NC dielectric materialdifferent from the first NC dielectric material.
 2. The method of claim1, wherein the forming the spacer structure comprises: forming arecessed region in the first region of the fin top portion; anddepositing a layer of the first NC dielectric material in the recessedregion.
 3. The method of claim 2, wherein the depositing the layer ofthe first NC dielectric material comprises: depositing a layer of high-kdielectric material; doping the layer of high-k dielectric material witha conductive material.
 4. The method of claim 1, wherein the forming thespacer structure comprises: forming a recessed region in the firstregion of the fin top portion; depositing a layer of the first NCdielectric material to line sides of the recessed region; and formingthe non-NC dielectric structure and the air gap on the layer of thefirst NC dielectric material within the recessed region.
 5. The methodof claim 4, wherein the forming the non-NC dielectric structure and theair gap comprises: depositing a layer of non-NC dielectric material tosubstantially fill an area of the recessed region lined with the layerof the first NC dielectric material; etching back the layer of non-NCdielectric material; and epitaxially growing a source/drain region onthe fin base portion and the first region of the fin top portion,wherein the source/drain region covers an opening of the recessed regionand forms the air gap between the source/drain region and the etchedbacked layer of non-NC dielectric material.
 6. The method of claim 1,wherein the forming the gate structure comprises etching a fin portionin the second region of the fin top portion, and wherein the fin portionis adjacent to the spacer structure.
 7. The method of claim 1, whereinthe forming the gate structure comprises depositing a layer of thesecond NC dielectric layer on the second region of the fin top portion,and wherein the second region is adjacent to the spacer structure. 8.The method of claim 7, wherein the depositing the layer of the second NCdielectric layer comprises: depositing a layer of hafnium oxide; anddoping the layer of hafnium oxide with a metal.
 9. The method of claim1, wherein the forming the gate structure comprises depositing the layerof the second NC dielectric layer wrapped around the second region ofthe fin top portion.
 10. The method of claim 1, wherein the forming thegate structure comprises depositing a work function metal layer wrappedaround the second region of the fin top portion.
 11. A method offabricating a semiconductor device, the method comprising: forming a finstructure with a stacked fin portion and a fin base portion on asubstrate, wherein the stacked fin portion is epitaxially grown on thefin base portion; forming an epitaxial source/drain region on the finstructure; forming a first negative capacitance (NC) dielectricstructure in a first region of the stacked fin portion, wherein thefirst NC dielectric structure comprises a first dielectric layer with afirst NC material; forming gate structures on a second region of thestacked fin portion, wherein the gate structures each comprises a seconddielectric layer with the first NC material; forming a source/draincontact structure on the epitaxial source/drain region; and forming asecond NC dielectric structure between the source/drain contactstructure and the gate structures, wherein the second NC dielectricstructure comprises a third dielectric layer with the first NC material.12. The method of claim 11, wherein the forming the first NC dielectricstructure comprises: forming a recessed region in the first region ofthe stacked fin portion; depositing a layer of the first NC materialwithin the recessed region; and forming a dielectric structure on thelayer of the first NC material within the recessed region.
 13. Themethod of claim 11, wherein the forming the second NC dielectricstructure comprises: forming a trench on the epitaxial source/drainregion between the gate structures; depositing a layer of the first NCmaterial along sides of the trench; depositing a nitride layer on thelayer of the first NC material; and etching back the nitride layer. 14.The method of claim 13, wherein the depositing the layer of the first NCmaterial comprises: depositing a layer of high-k dielectric material;and doping the layer of high-k dielectric material with a conductivematerial.
 15. The method of claim 13, wherein the depositing the layerof the first NC material comprises: depositing a layer of hafnium oxide;doping the layer of hafnium oxide with a metal; and annealing the dopedhafnium oxide.
 16. A method of fabricating a semiconductor device, themethod comprising: forming a fin structure with a fin base portion and afin top portion on a substrate; forming a spacer structure in a firstregion of the fin top portion, wherein the spacer structure comprises anegative capacitance (NC) dielectric layer comprising an NC dielectricmaterial, a non-NC dielectric structure, and an air gap; forming asource/drain region on the fin base portion and in contact with the fintop portion, wherein the source/drain region, the NC dielectric layer,and the non-NC dielectric structure enclose the air gap; and forming agate structure on a second region of the fin top portion, wherein thegate structure comprises a gate dielectric layer having the NCdielectric material.
 17. The method of claim 16, wherein the forming thespacer structure comprises: forming a recessed region in the firstregion of the fin top portion; depositing a layer of the NC dielectricmaterial in the recessed region; depositing a layer of non-NC dielectricmaterial to substantially fill the recessed region; etching back thelayer of non-NC dielectric material to form the non-NC dielectricstructure; and etching back the layer of NC dielectric material to formthe NC dielectric layer.
 18. The method of claim 17, wherein thedepositing the layer of the NC dielectric material comprises: depositinga layer of high-k dielectric material; and doping the layer of high-kdielectric material with a conductive material.
 19. The method of claim17, wherein the depositing the layer of the NC material comprises:depositing a layer of hafnium oxide; doping the layer of hafnium oxidewith a metal; and annealing the doped layer of hafnium oxide.
 20. Themethod of claim 16, wherein the forming the gate structure comprises:etching a fin portion in the second region of the fin top portion,wherein the fin portion is adjacent to the spacer structure; depositinga layer of the NC dielectric material wrapped around the second regionof the fin top portion; and depositing a work function metal layer onthe gate dielectric layer.